The key challenge for any magnetron-based thin film coating system is to create a high degree of ionization of the sputtered target material atoms at the substrate. Conventional plasma generator technologies such as DC, AC, RF, Pulsed Unipolar and Bipolar DC discharge have reached their usability, and cannot, with a single solution, meet today’s thin film market demands in quality, uniformity and throughput
Zpulser's AWF (Arbitrary Wave Form) pulsed DC MPP (Modulated Pulse Plasma) technology is not just an enhancement of an existing or outdated technology; it is a revolutionary new generator with arbitrary wave form programming that takes plasma material processing to a whole new level. Zpulser’s plasma generator Solo-xx or Axis-xx simultaneously addresses the three critical factors in AWF high power pulsed DC magnetron base plasma process technology: power, control and scalability. Click on the above headings to learn more.
Solo-xx or Axis-xx Key Technology Features:
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