New Era of Pulsed DC Generators for New Thin Film Development:
The key challenge for any magnetron-based thin film coating system is to create a high degree of ionization of the sputtered target material atoms at the substrate. Conventional plasma generator technologies such as DC, AC, RF, Pulsed Unipolar and Bipolar DC discharge have reached their usability, and cannot, with a single solution, meet today’s thin film market demands in quality, uniformity and throughput

Zpulser's AWF™ (Arbitrary Wave Form) pulsed DC MPP™ (Modulated Pulse Plasma) technology is not just an enhancement of an existing or outdated technology; it is a revolutionary new generator with arbitrary wave form programming that takes plasma material processing to a whole new level. Zpulser’s plasma generator Solo-xx™ or Axis-xx™ simultaneously addresses the three critical factors in AWF™ high power pulsed DC magnetron base plasma process technology: power, control and scalability. Click on the above headings to learn more.

Solo-xx™ or Axis-xx™ Key Technology Features:
Design:
  • Pushing the limits with the latest cutting edge power semiconductor technology
  • Simple yet highly intuitive & reliable design
  • Can be easily retrofitted into existing systems
  • Improves deposition and yield rates in both reactive and metal processes
  • Simple and friendly graphic user interface to develop arbitrary wave form with controllable voltage rise time, fall time, duration, amplitude, and modulation
  • Significantly reduces particle contamination
  • Works with any magnetron
  • Low CoO (Cost of Ownership)

Process:
  • Improves film properties for denser, tougher, brighter, and more transparent film
  • IImproves deposition and yield rates in both reactive and metal processes
  • Increases throughput by permitting operation at higher powers
  • Improves deposition and yield rates in both reactive and metal processes
  • Advanced arc suppression that significantly reduces particle contamination
  • Process results will vary based on magnetron designn
  • Technology is scalable
  • Enables the development of future processes


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