Power:
The Zpulser™ plasma generator Solo-xx™ or Axis-xx™ creates an AWF™ (Arbitrary Wave Form) pulsed DC magnetron discharge with controllable voltage rise time, fall time, duration, amplitude and modulation within a single macro-pulse. These features produce thin films with controllable mechanical properties, electrical properties and morphology.
Figure 1 is an example of a five stage voltage pulse (Vig, V1, V2, V3, and V4), Vig corresponds to plasma ignition voltage, and V1 through V4 represent voltage pulses with controllable rise time and modulation that trigger a high degree of plasma ionization.
The advantages of the Solo-xx™ or Axis-xx™ can be demonstrated scientifically by comparing a conventional DC magnetron sputtering process and an Axis-360™ optimized sputtering process.
 |
In Fig.2 the optical emission spectra for a conventional Titanium DC magnetron sputtering process is presented. The main peaks correspond to the neutral Titanium atoms. By applying a negative bias to the substrate during the process, the Titanium film still had columnar structure as shown in Fig. 3.
 |
In Fig.4 the optical emission spectra for a Zpulser™ Titanium magnetron sputtering process is presented. The main peaks correspond to the ionized Titanium atoms. By applying a negative bias to the substrate during the process, the Titanium film shows a denser structure as shown in Fig. 5..
 |
 |
FFig. 7, 8 & 9 shows a Zpulser™ sputtered TiN film with different bias levels. The SEM images clearly show unique dense structures and properties of the TiN films.
|
Sample
|
Hardness,
GPa |
Module,
GPa |
Coefficient
of friction |
Wear rate,
mm3/Nm |
|
Figure 7
|
31.4±3.3
|
373.5±16.0
|
0.22
|
1.088x10-6
|
|
Figure 8
|
29.5±1.5
|
270.4±14.1
|
0.38
|
3.088x10-6
|
|
Figure 9
|
32.9±1.4
|
460.1±29.7
|
0.17
|
1.27x10-6
|
 |
Fig. 10, 11 & 12, 13 shows a Zpulser™ sputtered Ti film with different bias levels. The SEM images clearly show unique dense structures and properties of the Ti films..
