Control:
A high power pulsed DC magnetron discharge exhibits native discharge voltage oscillations and plasma instabilities. This behavior affects the deposition rate and degree of ionization of the sputtered target material atoms. The Solo-xx™ or Axis-xx™ plasma generator adapts to these plasma oscillations and instabilities by using its proprietary circuit design and arbitrary wave form pulse shape programming to give unprecedented control of the plasma discharge. The combination of high power and intelligent control enables users to optimize film properties for each process or application.